Desktop Pro supports one or two cathodes with a confocal structure, providing high film uniformity on a 4-inch diameter. It is capable of pumping to high vacuum (in the range of 10-6 Torr) in less than 30 minutes, making it the perfect solution for multi-user environments that require rapid conversion.

Purpose:

Research on Sputtering Materials, Product Quality Control and Quality Assurance

Semiconductor Fault Analysis Nanotechnology Compound Semiconductors

Advantages:

This DC and RF sputtering system will improve your research productivity, provide consistent and repeatable performance, and significantly save space in the testing environment.